Advanced Capabilities for Industrial & Research AFM Applications
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300 mm Wafer Measurement Supporting Advanced Applications
Fully capable of measuring up to 300 mm wafers, it supports a wide range of advanced AFM applications, including electrical, nanomechanical, thermal and magnetic property measurements.
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Lower noise floor and minimal thermal drift
The improved mechanical structure reduces operational noise floor, thermal drift, and facilitates a more concentrated SLD beam spot, surpassing previous limits. This leads to higher measurement accuracy and high-resolution imaging.
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Small laser spot size
• Laser spot size is very small as SLD beam is focused through objective lens
• 11 µm of SLD beam diameter enables more applicability of fast Imaging cantilevers -
Faster Z servo performance
• Driven by a high-force piezoelectric stack and guided by a flexure structure
• New FX AFM electronic controller provides faster Z servo performance with better accuracy -
Specialized Industrial R&D Applications
Specialized industrial R&D applications with recipe-based routine measurements.
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Integrated Industrial-grade Facility
Integrated industrial-grade facility featuring a facility controller, a signal tower with an emergency-off unit, and optional contamination control solutions using a fan filter unit.
