FX40 with monitor

Park FX300

Premier 300 mm AFM for Research, Quality Control, and Assurance

Park FX300 is designed to break the boundaries between research and industrial applications, making it a true game-changer in atomic force microscopy. It supports various AFM techniques optimized for research, quality control, and reliability assurance. Park FX300 provides industry-specific research options, such as surface roughness profiling over large areas and precise wafer-level alignment and orientation control. It also features improved optical configurations for enhanced sample visualization and contamination management for ultra-clean measurement environments. These features make Park FX300 a vital solution for semiconductor post-processing, wafer-level packaging, and other advanced applications in industrial R&D.

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Advanced Capabilities for Industrial & Research AFM Applications

Intelligent Automation

It automates essential tasks including probe recognition and exchange, laser alignment, and parameter tuning, thereby boosting efficiency. It features 16 probe slots for repetitive measurements and mode transitions, reducing downtime and improving efficiency.

The Probe Identification Camera reads the QR code imprinted on the chip carrier of a new probe, displaying all pertinent information about each tip, including type, model, application, and usage. This allows for quick selection of the best probe tip for each job, ensuring accuracy and efficiency.

With automated probe exchange, it replaces old probes easily and safely with full automation. Featuring 16 probe slots for repetitive measurements and mode transitions, it reduces downtime and improves efficiency through rapid, autonomous probe switching.

Automatic Beam Alignment positions the laser beam onto the proper location of a cantilever and optimizes the spot’s position on the PSPD both vertically and laterally. It autonomously shifts the X, Y, and Z axes for clearer images with no distortion, all at the click of a button.

Simplified Operation

Automatic sequential measurement

It allows predefined coordinate settings on large samples, such as 300 mm wafers or samples on multi-sample chuck, for automated execution. It supports sequential measurements including topography and advanced modes, and streamlining workflows in research and industrial environments.

Next Generation AFM Controller for High-End Products

Park FX Controller is specifically designed to augment the performance of the Park FX Series. This significant development enables advanced Piezoresponse Force Microscopy (PFM) applications, such as Contact Resonance PFM (CR-PFM) and Dual-Frequency Resonance Tracking (DFRT-PFM), without the need for additional hardware. This ensures our customers can take full advantage of the latest advancements in atomic force microscopy.

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  • DFRT-PFM Without External Amplifiers
  • Enhanced Safety and Real-Time Environmental Monitoring
  • Direct Enablement of CR-PFM with Increased Tip Bias Modulation Bandwidth
  • Faster Ethernet Connectivity for Quick Data and Image Processing
FX40 with monitor

Park nano-IR Spectroscopy

Advanced nano-IR Spectroscopy for Large Sample Chemical Analysis

Park nano-IR is an integrated infrared (IR) spectroscopy and atomic force microscopy (AFM) system. The spectroscopy part provides chemical identification under 5 nm spatial resolution. It uses a non-contact technique offering the safest spectroscopy scanning and the best in industry spatial resolution. The microscopy part provides nanometer 3D topography with sub-angstrom height accuracy and mechanical property information to the user.